JEITA EDR-4712/500
Non-destructive recognition procedures of defects in Silicon Carbide Wafers (Part 5: The measurement method for defects in Silicon Carbide Wafer by X-ray topography)
Date Published:
2023-04-01
Status:
Valid
Japanese:
Japanese 36pages
JPY 9,200 ( JPY 9,200excl. tax )
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- Standard Abstract
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This technical report is about the non-destructive recognition procedures of defects in silicon carbide wafers (Part 5: The measurement method for defects in silicon carbide wafer by X-ray topography).More
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